Invention Grant
- Patent Title: Laser characterization system and process
- Patent Title (中): 激光表征系统和工艺
-
Application No.: US13303648Application Date: 2011-11-23
-
Publication No.: US08670109B2Publication Date: 2014-03-11
- Inventor: Yin Wang , Gerard P. Wysocki , Feng Xie , Chung-En Zah
- Applicant: Yin Wang , Gerard P. Wysocki , Feng Xie , Chung-En Zah
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Gregory V. Bean
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
A system and process for automatically characterizing a plurality of external cavity semiconductor laser chips on a semiconductor laser bar separated from a semiconductor wafer. The system includes a diffraction grating and a steering mirror mounted on a rotary stage for rotating the diffraction grating through a range of diffraction angles. A laser bar positioning stage for automatically aligning each laser chip in a laser bar with the diffraction grating. Reflecting a laser beam emitted from a laser chip in a laser bar with diffraction grating and steering mirror to the laser analyzer. Automatically rotating the diffraction grating through a range of diffraction angles relative to the laser beam and automatically characterizing the laser optical properties such as spectra, power, or spatial modes with the laser analyzer at each diffraction angle.
Public/Granted literature
- US20120268743A1 LASER CHARACTERIZATION SYSTEM AND PROCESS Public/Granted day:2012-10-25
Information query