发明授权
- 专利标题: Power MOSFET
- 专利标题(中): 功率MOSFET
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申请号: US13596081申请日: 2012-08-28
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公开(公告)号: US08664714B2公开(公告)日: 2014-03-04
- 发明人: Chu-Kuang Liu
- 申请人: Chu-Kuang Liu
- 申请人地址: TW Hsinchu County
- 专利权人: Excelliance MOS Corporation
- 当前专利权人: Excelliance MOS Corporation
- 当前专利权人地址: TW Hsinchu County
- 代理机构: Jianq Chyun IP Office
- 优先权: TW101205178A 20120322
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
A power MOSFET includes an epitaxy substrate, conductive trenches, well regions and a dielectric layer. The power MOSFET further has at least one termination structure including at lest one of the conductive trenches, some of the well regions within a termination area and mutually insulated by the conductive trench, a field plate, a contact plug and a heavily-doped region. The field plate including a plate metal and the dielectric layer is on the well regions and the conductive trench within the termination area. The contact plug penetrates through the dielectric layer and connects the plate metal and one of the well regions, so the plate metal has equal potential with the connected well region through the contact plug. The well regions and the conductive trench are electrically coupled to the plate metal by the dielectric layer. The heavily-doped region is between the contact plug and the connected well region.
公开/授权文献
- US20130248986A1 POWER MOSFET 公开/授权日:2013-09-26
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