发明授权
- 专利标题: Field-effect inter-digitated back contact photovoltaic device
- 专利标题(中): 场效应数字后反接触光电器件
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申请号: US13718748申请日: 2012-12-18
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公开(公告)号: US08642378B1公开(公告)日: 2014-02-04
- 发明人: Keith E. Fogel , Bahman Hekmatshoartabari , Devendra K. Sadana , Ghavam G. Shahidi , Davood Shahrjerdi
- 申请人: International Business Machines Corporation
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Tutunjian & Bitetto, P.C.
- 代理商 Louis J. Percello
- 主分类号: H01L31/00
- IPC分类号: H01L31/00 ; H02N6/00

摘要:
A method for forming a photovoltaic device includes patterning a dielectric layer on a substrate to form a patterned dielectric having local spacings between shapes and remote spacings between groups of shapes, and depositing a doped epitaxial layer over the patterned dielectric such that selective crystalline growth occurs in portions of the epitaxial layer in contact with the substrate and noncrystalline growth occurs in portions of the epitaxial layer in contact with the patterned dielectric. First metal contacts are formed over the local spacings of the patterned dielectric, and second metal contacts are formed over the remote spacings. Exposed portions of the noncrystalline growth are etched using the first and second metal contacts as an etch mask to form alternating interdigitated emitter and back contact stacks.
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