发明授权
US08634052B2 Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table
失效
平版印刷设备和方法涉及一个环以覆盖基板和基板台之间的间隙
- 专利标题： Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table
- 专利标题（中）： 平版印刷设备和方法涉及一个环以覆盖基板和基板台之间的间隙
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申请号： US11987131申请日： 2007-11-27
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公开(公告)号： US08634052B2公开(公告)日： 2014-01-21
- 发明人: Suzan Leonie Auer-Jongepier , Jeroen Johannes Sophia Maria Mertens , Frank Bernhard Sperling , Teunis Cornelis Van Den Dool , Eva Mondt , Alexander Nikolov Zdravkov , Paulus Martinus Hubertus Vissers
- 申请人： Suzan Leonie Auer-Jongepier , Jeroen Johannes Sophia Maria Mertens , Frank Bernhard Sperling , Teunis Cornelis Van Den Dool , Eva Mondt , Alexander Nikolov Zdravkov , Paulus Martinus Hubertus Vissers
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
A lithographic apparatus that includes a substrate table holding a substrate, a projection system configured to project a patterned beam of radiation onto the substrate, a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table, and a ring located such that it covers a gap between the substrate and the substrate table, the ring being in contact with the substrate and with the substrate table.
公开/授权文献
- US20080186460A1 Lithographic apparatus and method 公开/授权日：2008-08-07
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