Invention Grant
- Patent Title: Semiconductor epitaxy on diamond for heat spreading applications
- Patent Title (中): 用于热扩散应用的金刚石上的半导体外延
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Application No.: US12777907Application Date: 2010-05-11
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Publication No.: US08609461B1Publication Date: 2013-12-17
- Inventor: Ganesh Balakrishnan , Jerome V. Moloney , Victor Hasson
- Applicant: Ganesh Balakrishnan , Jerome V. Moloney , Victor Hasson
- Applicant Address: US NM Albuquerque
- Assignee: STC.UNM
- Current Assignee: STC.UNM
- Current Assignee Address: US NM Albuquerque
- Agency: MH2 Technology Law Group, LLP
- Main IPC: H01L29/72
- IPC: H01L29/72

Abstract:
Various embodiments provide methods for forming a diamond heat spreader and integrating the diamond heat spreader with a heat source without generating voids at the interface. In one embodiment, a semiconductor layer can be epitaxially formed on a diamond substrate having a desirably low surface root mean square (RMS) roughness. The semiconductor epi-layer can be used as an interface layer for bonding the diamond substrate to the heat source to provide efficient heat spreading.
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