Invention Grant
- Patent Title: Target supply apparatus
- Patent Title (中): 目标供应装置
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Application No.: US12642308Application Date: 2009-12-18
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Publication No.: US08604451B2Publication Date: 2013-12-10
- Inventor: Takayuki Yabu , Masaki Nakano , Hitoshi Nagano , Takanobu Ishihara
- Applicant: Takayuki Yabu , Masaki Nakano , Hitoshi Nagano , Takanobu Ishihara
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: McDermott Will & Emery LLP
- Priority: JP2008-324497 20081219; JP2009-285787 20091216
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G01J3/10 ; A61N5/06

Abstract:
A target supply apparatus controls a gas pressure inside a tank storing a liquid target material to be outputted from a nozzle by a pressure of gas supplied from a gas supply having a pressure regulator. The target supply apparatus comprises a gas passage introducing gas supplied from the gas supply into the tank, and a high-precision pressure regulator arranged on the gas passage and regulating a pressure of gas flowing the gas passage. The high-precision pressure regulator is able to regulate pressure with accuracy higher than the pressure regulator.
Public/Granted literature
- US20100213272A1 TARGET SUPPLY APPARATUS Public/Granted day:2010-08-26
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