Invention Grant
- Patent Title: System and method to optimize extreme ultraviolet light generation
- Patent Title (中): 优化极紫外光发生的系统和方法
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Application No.: US13549261Application Date: 2012-07-13
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Publication No.: US08598552B1Publication Date: 2013-12-03
- Inventor: Paul Frihauf , Daniel J. Riggs , Matthew R. Graham , Steven Chang , Wayne J. Dunstan
- Applicant: Paul Frihauf , Daniel J. Riggs , Matthew R. Graham , Steven Chang , Wayne J. Dunstan
- Applicant Address: US CA San Diego
- Assignee: Cymer, Inc.
- Current Assignee: Cymer, Inc.
- Current Assignee Address: US CA San Diego
- Agency: Gard & Kaslow LLP
- Main IPC: H05G2/00
- IPC: H05G2/00 ; H01L21/027 ; G03F7/20

Abstract:
Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam can maintain focus on a target material to generate the plasma that gives off light. The system and method described herein optimize EUV light generation by using a closed-loop gradient process to track and fine-tune in real-time the positioning of optical elements that determine how the laser beam is focused on the target material. When real-time alignment of the drive laser on droplet position is achieved, EUV generation is optimized.
Public/Granted literature
- US20130320244A1 System and Method To Optimize Extreme Ultraviolet Light Generation Public/Granted day:2013-12-05
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