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US08598552B1 System and method to optimize extreme ultraviolet light generation 有权
优化极紫外光发生的系统和方法

System and method to optimize extreme ultraviolet light generation
Abstract:
Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam can maintain focus on a target material to generate the plasma that gives off light. The system and method described herein optimize EUV light generation by using a closed-loop gradient process to track and fine-tune in real-time the positioning of optical elements that determine how the laser beam is focused on the target material. When real-time alignment of the drive laser on droplet position is achieved, EUV generation is optimized.
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