Invention Grant
- Patent Title: High throughput birefringence measurement
- Patent Title (中): 高通量双折射测量
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Application No.: US13002650Application Date: 2009-07-02
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Publication No.: US08582101B2Publication Date: 2013-11-12
- Inventor: Baoliang Wang
- Applicant: Baoliang Wang
- Applicant Address: US OR Hillsboro
- Assignee: Hinds Instruments, Inc.
- Current Assignee: Hinds Instruments, Inc.
- Current Assignee Address: US OR Hillsboro
- Agency: Hancock Hughey LLP
- International Application: PCT/US2009/049614 WO 20090702
- International Announcement: WO2010/005874 WO 20100114
- Main IPC: G01J4/00
- IPC: G01J4/00

Abstract:
Improving the throughput of systems for measuring birefringence of optical samples includes techniques for directing multiple beams through the photoelastic modulator component of the system so that, along with expanded detection mechanisms to accommodate the multiple beams, the heretofore scanning (via a single beam) of a line across the sample is considerably enlarged so that several lines covering a “swath” of the sample area is scanned by the system of the present invention.
Public/Granted literature
- US20110181883A1 High Throughput Birefringence Measurement Public/Granted day:2011-07-28
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