Invention Grant
- Patent Title: Resonance tunneling devices and methods of manufacturing the same
- Patent Title (中): 共振隧道装置及其制造方法
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Application No.: US13915851Application Date: 2013-06-12
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Publication No.: US08581235B2Publication Date: 2013-11-12
- Inventor: Jonghyurk Park , Seung Youl Kang
- Applicant: Electronics and Telecommunications Research Institute
- Applicant Address: KR Daejeon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejeon
- Agency: Rabin & Berdo, P.C.
- Priority: KR10-2011-0028909 20110330
- Main IPC: H01L29/06
- IPC: H01L29/06

Abstract:
Provided are a resonance tunneling device and a method of manufacturing the resonance tunneling device. The resonance tunneling device includes a substrate, a plurality of electrodes disposed on the substrate, and a nanoparticle layer disposed between the electrodes, and doped with an impurity. The nanoparticle layer uses the impurity to exhibit resonance tunneling where a current peak occurs at a target bias voltage applied between the electrodes.
Public/Granted literature
- US20130270522A1 RESONANCE TUNNELING DEVICES AND METHODS OF MANUFACTURING THE SAME Public/Granted day:2013-10-17
Information query
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