Invention Grant
- Patent Title: Pad design for circuit under pad in semiconductor devices
- Patent Title (中): 垫片设计用于半导体器件衬底下的电路
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Application No.: US13288731Application Date: 2011-11-03
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Publication No.: US08569856B2Publication Date: 2013-10-29
- Inventor: Yin Qian , Hsin-Chih Tai , Keh-Chiang Ku , Vincent Venezia , Duli Mao , Wei Zheng , Howard E. Rhodes
- Applicant: Yin Qian , Hsin-Chih Tai , Keh-Chiang Ku , Vincent Venezia , Duli Mao , Wei Zheng , Howard E. Rhodes
- Applicant Address: US CA Santa Clara
- Assignee: OmniVision Technologies, Inc.
- Current Assignee: OmniVision Technologies, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Embodiments of a semiconductor device that includes a semiconductor substrate and a cavity disposed in the semiconductor substrate that extends at least from a first side of the semiconductor substrate to a second side of the semiconductor substrate. The semiconductor device also includes an insulation layer disposed over the first side of the semiconductor substrate and coating sidewalls of the cavity. A conductive layer including a bonding pad is disposed over the insulation layer. The conductive layer extends into the cavity and connects to a metal stack disposed below the second side of the semiconductor substrate. A through silicon via pad is disposed below the second side of the semiconductor substrate and connected to the metal stack. The through silicon via pad is position to accept a through silicon via.
Public/Granted literature
- US20130113065A1 PAD DESIGN FOR CIRCUIT UNDER PAD IN SEMICONDUCTOR DEVICES Public/Granted day:2013-05-09
Information query
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