发明授权
- 专利标题: Method, apparatus and system for use in processing wafers
- 专利标题(中): 用于处理晶片的方法,设备和系统
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申请号: US13290900申请日: 2011-11-07
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公开(公告)号: US08565919B2公开(公告)日: 2013-10-22
- 发明人: William J. Kalenian , Thomas A. Walsh , Dave Halley
- 申请人: William J. Kalenian , Thomas A. Walsh , Dave Halley
- 申请人地址: US CA San Luis Obispo
- 专利权人: Strasbaugh
- 当前专利权人: Strasbaugh
- 当前专利权人地址: US CA San Luis Obispo
- 代理机构: Fitch, Even, Tabin & Flannery LLP
- 主分类号: B65H1/00
- IPC分类号: B65H1/00 ; G06F19/00
摘要:
The present embodiment provides for methods and systems for use in processing objects such as wafers, including polishing and/or grinding wafers. Some embodiments provide systems that include a front-end module and a processing module. The front end module couples with a storage device that stores objects for processing. The front-end module can comprise a single robot, a transfer station, and a plurality of end effectors. The processing module is coupled with the front-end module such that the single robot delivers objects from the storage device to the processing module. The processing module comprising a rotating table, and a spindle with a carrier configured to retrieve the delivered object and process the object on the rotating table.
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