发明授权
- 专利标题： MEMS device and fabrication method thereof
- 专利标题（中）： MEMS器件及其制造方法
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申请号： US12907337申请日： 2010-10-19
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公开(公告)号： US08552512B2公开(公告)日： 2013-10-08
- 发明人: Shogo Inaba , Akira Sato , Toru Watanabe , Takeshi Mori
- 申请人： Shogo Inaba , Akira Sato , Toru Watanabe , Takeshi Mori
- 申请人地址： JP
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP
- 代理机构： Harness, Dickey & Pierce, P.L.C.
- 优先权： JP2006-286035 20061020; JP2007-131316 20070517
- 主分类号： H01L29/84
- IPC分类号： H01L29/84
摘要：
A micro electro mechanical system (MEMS) device includes: a fixed electrode made of silicon and provided above a semiconductor substrate; a movable electrode made of silicon and arranged in a mechanically movable manner by having a gap from the semiconductor substrate; and a wiring layered part that is provided around the movable electrode, covers a portion of the fixed electrode and includes wiring. One of the fixed electrode and the movable electrode is implanted with an impurity ion and at least a part of the portion of the fixed electrode covered by the wiring layered part is silicidized.
公开/授权文献
- US20110031564A1 MEMS DEVICE AND FABRICATION METHOD THEREOF 公开/授权日：2011-02-10
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