发明授权
US08506890B2 Method for purification of silica particles, purifier, and purified silica particles
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纯化二氧化硅颗粒,净化剂和纯化二氧化硅颗粒的方法
- 专利标题: Method for purification of silica particles, purifier, and purified silica particles
- 专利标题(中): 纯化二氧化硅颗粒,净化剂和纯化二氧化硅颗粒的方法
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申请号: US13047433申请日: 2011-03-14
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公开(公告)号: US08506890B2公开(公告)日: 2013-08-13
- 发明人: Minoru Kanda , Yoshiyuki Tsuji
- 申请人: Minoru Kanda , Yoshiyuki Tsuji
- 申请人地址: JP Akita-shi
- 专利权人: Japan Super Quartz Corporation
- 当前专利权人: Japan Super Quartz Corporation
- 当前专利权人地址: JP Akita-shi
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2005-313795 20051028
- 主分类号: B01J8/24
- IPC分类号: B01J8/24 ; B01J19/08
摘要:
To provide a treatment method having excellent purification effect, in which impurities having high ionicity in a silica powder can be removed in a short time, an apparatus thereof, and a purified silica powder. A purification method of a silica powder comprises making a silica powder into a fluid state; contacting a purified gas to the silica powder in the fluid state at high temperature; and thereby removing impurity components of the silica powder. In the method, the silica powder in the fluid state is positioned in a magnetic field region. Further, the silica powder is contacted with the purified gas, while applying voltage to the silica powder by an electric field generated by moving of the silica powder. Preferably, the silica powder in a fluid state is positioned in the magnetic region of 10 gausses or more, and contacted with the purification gas at a temperature of I000° C. or more.
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