The present invention aims to improve accuracy of a planar manufacturing drawing used to instruct manufacture of a three-dimensional structure in a planar form. According to path plan information is acquired by a path plan information acquisition unit 11a and manufacturing requirement information is acquired by a manufacturing requirement information acquisition unit, a layout configuration production unit 11c produces a layout configuration model in which the three-dimensional structure is laid out in a planar manner based on a manufacture layout and distortion of the wire harness. Then, a simulation unit 11d simulates a transformation from the layout configuration model to the mounting configuration model with which the three-dimensional structure is mounted to a mount object. Then, an evaluation item evaluating unit 11e evaluates a predetermined evaluation item by comparing the simulation result and the three-dimensional structure indicated by the path plan information. Then, an evaluation result information output unit 11f outputs the evaluation result to support path designing of the three-dimensional structure and/or production of the planar manufacturing drawing.