发明授权
- 专利标题: Protecting semiconducting oxides
- 专利标题(中): 保护半导体氧化物
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申请号: US13603383申请日: 2012-09-04
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公开(公告)号: US08497506B2公开(公告)日: 2013-07-30
- 发明人: Tse N. Ng , Michael L. Chabinyc
- 申请人: Tse N. Ng , Michael L. Chabinyc
- 申请人地址: US CA Palo Alto
- 专利权人: Palo Alto Research Center Incorporated
- 当前专利权人: Palo Alto Research Center Incorporated
- 当前专利权人地址: US CA Palo Alto
- 代理机构: Hollingsworth Davis, LLC
- 主分类号: H01L29/04
- IPC分类号: H01L29/04
摘要:
In transistor structures such as thin film transistors (TFTs) in an array of cells, a layer of semiconducting oxide material that includes a channel is protected by a protective layer that includes low-temperature encapsulant material. The semiconducting oxide material can be a transition metal oxide material such as zinc oxide, and can be in an active layered substructure that also includes channel end electrodes. The low-temperature encapsulant can, for example, be an organic polymer such as poly(methyl methacrylate) or parylene, deposited on an exposed region of the oxide layer such as by spinning, spincasting, evaporation, or vacuum deposition or an inorganic polymer deposited such as by spinning or liquid deposition. The protective layer can include a lower sublayer of low-temperature encapsulant on the exposed region and an upper sublayer of inorganic material on the lower sublayer. For roll-to-roll processing, a mechanically flexible, low-temperature substrate can be used.
公开/授权文献
- US20120326149A1 Protecting Semiconducting Oxides 公开/授权日:2012-12-27
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