Invention Grant
- Patent Title: Spin injection layer robustness for microwave assisted magnetic recording
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Application No.: US13200844Application Date: 2011-10-03
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Publication No.: US08488373B2Publication Date: 2013-07-16
- Inventor: Kunliang Zhang , Min Li , Yuchen Zhou , Soichi Oikawa , Hitoshi Iwasaki , Kenichiro Yamada , Katsuhiko Koui
- Applicant: Kunliang Zhang , Min Li , Yuchen Zhou , Soichi Oikawa , Hitoshi Iwasaki , Kenichiro Yamada , Katsuhiko Koui
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: TDK Corporation,Kabushiki Kaisha Toshiba
- Current Assignee: TDK Corporation,Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A spin transfer (torque) oscillator (STO) with a non-magnetic spacer formed between a spin injection layer (SIL) and a field generation layer (FGL), and with an interfacial layer comprised of Fe(100-V)CoV where v is from 5 to 100 atomic % formed between the SIL and non-magnetic spacer is disclosed. A composite seed layer made of Ta and a metal layer having a fcc(111) or hcp(001) texture is used to enhance perpendicular magnetic anisotropy (PMA) in the STO device. The interfacial layer quenches SIL oscillations and thereby stabilizes the SIL against FGL oscillations. The interfacial layer preferably has a thickness from 5 to 50 Angstroms and enhances amplitude (dR/R) in the STO device. The STO device may have a top SIL or bottom SIL configuration. The SIL is typically a laminated structure such as (Co/Ni)X where x is between 5 and 50.
Public/Granted literature
- US20130082787A1 Spin injection layer robustness for microwave assisted magnetic recording Public/Granted day:2013-04-04
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