Invention Grant
US08476468B2 Removal of extraneous metals from silicon compounds by adsorption and/or filtration
有权
通过吸附和/或过滤从硅化合物中去除外来金属
- Patent Title: Removal of extraneous metals from silicon compounds by adsorption and/or filtration
- Patent Title (中): 通过吸附和/或过滤从硅化合物中去除外来金属
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Application No.: US13121702Application Date: 2009-10-13
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Publication No.: US08476468B2Publication Date: 2013-07-02
- Inventor: Hartwig Rauleder , Ekkehard Mueh
- Applicant: Hartwig Rauleder , Ekkehard Mueh
- Applicant Address: DE Essen
- Assignee: Evonik Degussa GmbH
- Current Assignee: Evonik Degussa GmbH
- Current Assignee Address: DE Essen
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: DE102008054537 20081211
- International Application: PCT/EP2009/063316 WO 20091013
- International Announcement: WO2010/066487 WO 20100617
- Main IPC: C07F7/08
- IPC: C07F7/08

Abstract:
The invention relates to a process for treating a composition containing silicon compounds, especially organosilanes and/or inorganic silanes, and at least one extraneous metal and/or a compound containing extraneous metal, wherein the composition is contacted with at least one adsorbent and/or a first filter and then a composition in which the content of the extraneous metal and/or of the compound containing extraneous metal has been reduced is obtained. The invention further relates to the use of organic resins, activated carbon, silicates and/or zeolites and/or else of at least one filter with small pore sizes to reduce the level of the compounds mentioned.
Public/Granted literature
- US20110184205A1 REMOVAL OF EXTRANEOUS METALS FROM SILICON COMPOUNDS BY ADSORPTION AND/OR FILTRATION Public/Granted day:2011-07-28
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