Invention Grant
- Patent Title: Method of manufacturing a thin-film magnetic head
- Patent Title (中): 制造薄膜磁头的方法
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Application No.: US13067462Application Date: 2011-06-02
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Publication No.: US08448330B2Publication Date: 2013-05-28
- Inventor: Yoshitaka Sasaki , Tohru Inoue
- Applicant: Yoshitaka Sasaki , Tohru Inoue
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2000-33958 20000210
- Main IPC: G11B5/17
- IPC: G11B5/17 ; G11B5/23

Abstract:
A manufacturing method for a thin-film magnetic head including first and second magnetic layers, a gap layer, a thin-film coil, and a coil insulating layer for insulating neighboring ones of turns of the thin-film coil. The manufacturing method includes the steps of: forming the first magnetic layer; forming the gap layer on the first magnetic layer; forming the second magnetic layer on the gap layer; forming the thin-film coil; and forming the coil insulating layer. The coil insulating layer is formed by stacking a plurality of insulating films formed by chemical vapor deposition.
Public/Granted literature
- US20110252631A1 Method of manufacturing a thin-film magnetic head Public/Granted day:2011-10-20
Information query
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