Invention Grant
- Patent Title: Production of free-standing solid state layers by thermal processing of substrates with a polymer
- Patent Title (中): 通过用聚合物热处理基底来制备独立的固态层
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Application No.: US12740373Application Date: 2008-10-24
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Publication No.: US08440129B2Publication Date: 2013-05-14
- Inventor: Lukas Lichtensteiger , Christian Pfeffer
- Applicant: Lukas Lichtensteiger , Christian Pfeffer
- Applicant Address: US MA Cambridge
- Assignee: President and Fellows of Harvard College
- Current Assignee: President and Fellows of Harvard College
- Current Assignee Address: US MA Cambridge
- Agent Theresa A. Lober
- Priority: CH1712/07 20071102; CH1851/07 20071130
- International Application: PCT/US2008/012140 WO 20081024
- International Announcement: WO2009/061353 WO 20090514
- Main IPC: B29C67/00
- IPC: B29C67/00

Abstract:
In a method for producing a free-standing solid state layer, a solid state material is provided having at least one surface available for layer formation thereon and a layer of polymer is formed on the available surface. The solid state material and polymer layer are then exposed to a change in local temperature from a first temperature that is no greater than about 300° C. to a second temperature below about room temperature to cause the solid state material to fracture along a plane at a depth in the material, to produce at least one free-standing solid state layer from the solid state material.
Public/Granted literature
- US20100289189A1 PRODUCTION OF FREE-STANDING SOLID STATE LAYERS BY THERMAL PROCESSING OF SUBSTRATES WITH A POLYMER Public/Granted day:2010-11-18
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