Invention Grant
- Patent Title: Method for producing anti-glare film
- Patent Title (中): 抗眩光膜的制造方法
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Application No.: US12842711Application Date: 2010-07-23
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Publication No.: US08420161B2Publication Date: 2013-04-16
- Inventor: Hitoshi Watanabe , Yumi Haga , Tsutomu Nagahama , Shinichi Matsumura
- Applicant: Hitoshi Watanabe , Yumi Haga , Tsutomu Nagahama , Shinichi Matsumura
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JPP2007-064553 20070314; JPP2008-003463 20080110
- Main IPC: B05D5/06
- IPC: B05D5/06

Abstract:
A method for producing an anti-glare film includes applying a coating composition including at least a resin, a solvent, and fine particles to a substrate; drying the coating composition applied to the substrate so that a Benard cell structure is formed in the surface of the coating layer due to convection caused during volatilization of the solvent; and curing the resin contained in the coating composition having formed therein a Benard cell structure to form an anti-glare layer having fine irregularities with a moderate surface waviness. The anti-glare layer has a degree of white muddiness of 1.7 or less, as measured by quantitatively determining a diffuse reflection component of the diffused light incident upon the surface of the anti-glare layer.
Public/Granted literature
- US20100291316A1 METHOD FOR PRODUCING ANTI-GLARE FILM Public/Granted day:2010-11-18
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