发明授权
US08389205B2 Patterning nano-scale patterns on a film comprising unzipping polymer chains
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在包含解链聚合物链的膜上形成纳米尺度图案
- 专利标题: Patterning nano-scale patterns on a film comprising unzipping polymer chains
- 专利标题(中): 在包含解链聚合物链的膜上形成纳米尺度图案
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申请号: US12482500申请日: 2009-06-11
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公开(公告)号: US08389205B2公开(公告)日: 2013-03-05
- 发明人: Urs T. Duerig , Jane E. Frommer , Bernd W. Gotsmann , James L. Hedrick , Armin W. Knoll , Robert D. Miller , David Pires , Charles G. Wade
- 申请人: Urs T. Duerig , Jane E. Frommer , Bernd W. Gotsmann , James L. Hedrick , Armin W. Knoll , Robert D. Miller , David Pires , Charles G. Wade
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理商 Jeffrey T. Holman
- 主分类号: G03F7/26
- IPC分类号: G03F7/26
摘要:
The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g. thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g. into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.
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