Invention Grant
- Patent Title: High resolution energy-selecting electron beam apparatus
- Patent Title (中): 高分辨率能量选择电子束装置
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Application No.: US12924320Application Date: 2010-09-24
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Publication No.: US08373137B2Publication Date: 2013-02-12
- Inventor: Ondrej L. Krivanek , Niklas Dellby
- Applicant: Ondrej L. Krivanek , Niklas Dellby
- Applicant Address: US WA Kirkland
- Assignee: Nion Co.
- Current Assignee: Nion Co.
- Current Assignee Address: US WA Kirkland
- Main IPC: H01J3/26
- IPC: H01J3/26

Abstract:
A high resolution energy-selecting electron beam apparatus and method for improving the energy resolution of electron-optical systems by restricting the energy range of admitted electrons, and optionally also for improving the spatial resolution by correcting chromatic and geometric aberrations. The apparatus comprises a plurality of magnetic or electrostatic prisms that disperse an electron beam according to the energies of the electrons into an energy spectrum, a plurality of magnifying lenses such as electromagnetic or electrostatic quadrupoles that increase the energy dispersion of the energy spectrum, an energy-selecting slit that selects a desirable range of energies of the electrons, and optionally also sextupole, octupole and higher-order lenses that correct chromatic and geometric aberration of the electron-optical system. The apparatus also comprises further magnetic or electrostatic prisms and electron lenses arranged such that the energy dispersion of the electron beam emerging from the apparatus is cancelled.
Public/Granted literature
- US20120074315A1 High resolution energy-selecting electron beam apparatus Public/Granted day:2012-03-29
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