发明授权
US08368378B2 Plasma measurement device, plasma system, and method for measuring plasma characteristics
有权
等离子体测量装置,等离子体系统和等离子体特性测量方法
- 专利标题: Plasma measurement device, plasma system, and method for measuring plasma characteristics
- 专利标题(中): 等离子体测量装置,等离子体系统和等离子体特性测量方法
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申请号: US12694412申请日: 2010-01-27
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公开(公告)号: US08368378B2公开(公告)日: 2013-02-05
- 发明人: Ta-Lun Sung , Chung-Ming Liu , Kuen Ting , Shosaku Matsumura , Shinriki Teii
- 申请人: Ta-Lun Sung , Chung-Ming Liu , Kuen Ting , Shosaku Matsumura , Shinriki Teii
- 申请人地址: TW Taoyuan County
- 专利权人: Lunghwa University of Science and Technology
- 当前专利权人: Lunghwa University of Science and Technology
- 当前专利权人地址: TW Taoyuan County
- 代理机构: Kamrath IP Lawfirm, P.A.
- 代理商 Alan Kamrath
- 优先权: TW98122588A 20090703
- 主分类号: G01N27/66
- IPC分类号: G01N27/66
摘要:
A plasma measurement device used for measuring plasma characteristics of radio frequency plasma a probe, a connector electronic wire, and a power supply device. The probe is used for entering the radio frequency plasma to measure the plasma characteristics. One end of the connector electronic wire is electrically connected to the probe. The power supply device is electrically connected to another end of the connector electronic wire, and the power supply device is used for providing a voltage to the probe. The connector electronic wire is a specific length, and the connector electronic wire and the radio frequency plasma would generate a standing wave effect. Thus, according to the standing wave effect, the plasma measurement device could eliminate high-frequency interference generated by the radio frequency plasma while measuring the plasma characteristics.
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