发明授权
- 专利标题： Protective layer for implant photoresist
- 专利标题（中）： 植入光刻胶的保护层
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申请号： US12339514申请日： 2008-12-19
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公开(公告)号： US08361564B2公开(公告)日： 2013-01-29
- 发明人: Andrew R. Romano , S. M. Reza Sadjadi
- 申请人： Andrew R. Romano , S. M. Reza Sadjadi
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 代理机构： Beyer Law Group LLP
- 主分类号： C23C14/04
- IPC分类号： C23C14/04 ; C23C14/14 ; C23C14/00
摘要：
A method for implanting a dopant in a substrate is provided. A patterned photoresist mask is formed over the substrate, wherein the patterned photoresist mask has patterned photoresist mask features. A protective layer is deposited on the patterned photoresist mask by performing a cyclical deposition, wherein each cycle, comprises a depositing phase for depositing a deposition layer over surfaces of the patterned mask of photoresist material and a profile shaping phase for providing vertical sidewalls. A dopant is implanted into the substrate using an ion beam. The protective layer and photoresist mask are removed.
公开/授权文献
- US20120328781A9 PROTECTIVE LAYER FOR IMPLANT PHOTORESIST 公开/授权日：2012-12-27
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