发明授权
- 专利标题: Liquid vaporization system
- 专利标题(中): 液体蒸发系统
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申请号: US13498902申请日: 2010-03-30
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公开(公告)号: US08361231B2公开(公告)日: 2013-01-29
- 发明人: Masayuki Kouketsu , Hiroshi Itafuji
- 申请人: Masayuki Kouketsu , Hiroshi Itafuji
- 申请人地址: JP Komaki-shi, Aichi
- 专利权人: CKD Corporation
- 当前专利权人: CKD Corporation
- 当前专利权人地址: JP Komaki-shi, Aichi
- 代理机构: Beyer Law Group LLP
- 优先权: JP2009-226691 20090930
- 国际申请: PCT/JP2010/055652 WO 20100330
- 国际公布: WO2011/040067 WO 20110407
- 主分类号: C23C16/00
- IPC分类号: C23C16/00 ; B05C11/00
摘要:
Provided is a liquid vaporization system capable of promoting vaporization of a liquid material while solving a problem of residual liquid material. A liquid vaporization system has a liquid vaporization apparatus having a pump and a vaporizer. The vaporizer has a case, a heater provided inside the case, a heat storage plate heated by the heater, and a mesh. The mesh is formed by interweaving wires and has an overall flat plate shape. By overlapping the mesh on an upper surface of the heat storage plate, minute irregularities are formed on the heat storage plate by the mesh. A nozzle is provided above the mesh, whereby the liquid material is dropped from the nozzle onto the heat storage plate. The liquid material spreads over the heat storage plate in a thin film and is heated and vaporized on the upper surface of the heat storage plate.
公开/授权文献
- US20120180724A1 LIQUID VAPORIZATION SYSTEM 公开/授权日:2012-07-19
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