Invention Grant
- Patent Title: Graphene pattern and process of preparing the same
- Patent Title (中): 石墨烯图案及其制备方法
-
Application No.: US12122293Application Date: 2008-05-16
-
Publication No.: US08337949B2Publication Date: 2012-12-25
- Inventor: Jae-Young Choi , Hyeon-Jin Shin , Seon-mi Yoon
- Applicant: Jae-Young Choi , Hyeon-Jin Shin , Seon-mi Yoon
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2007-0094895 20070918; KR10-2008-0023458 20080313
- Main IPC: B05D3/02
- IPC: B05D3/02
Abstract:
Provided are a graphene pattern and a process of preparing the same. Graphene is patterned in a predetermined shape on a substrate to form the graphene pattern. The graphene pattern can be formed by forming a graphitizing catalyst pattern on a substrate, contacting a carbonaceous material with the graphitizing catalyst and heat-treating the resultant.
Public/Granted literature
- US20090324897A1 GRAPHENE PATTERN AND PROCESS OF PREPARING THE SAME Public/Granted day:2009-12-31
Information query
