Invention Grant
- Patent Title: Transparent conductor based pinned photodiode
- Patent Title (中): 透明导体固定光电二极管
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Application No.: US12704769Application Date: 2010-02-12
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Publication No.: US08298846B2Publication Date: 2012-10-30
- Inventor: Chandra Mouli , Howard E. Rhodes
- Applicant: Chandra Mouli , Howard E. Rhodes
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Dickstein Shapiro LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A pinned photodiode with improved short wavelength light response. In exemplary embodiments of the invention, a gate oxide is formed over a doped, buried region in a semiconductor substrate. A gate conductor is formed on top of the gate oxide. The gate conductor is transparent, and in one embodiment is a layer of indium-tin oxide. The transparent conductor can be biased to reduce the need for a surface dopant in creating a pinned photodiode region. The biasing of the transparent conductor produces a hole-rich accumulation region near the surface of the substrate. The gate conductor material permits a greater amount of charges from short wavelength light to be captured in the photo-sensing region in the substrate, and thereby increases the quantum efficiency of the photosensor.
Public/Granted literature
- US20100201859A1 Transparent Conductor Based Pinned Photodiode Public/Granted day:2010-08-12
Information query
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