Invention Grant
- Patent Title: Dual scanning stage
- Patent Title (中): 双扫描阶段
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Application No.: US12834220Application Date: 2010-07-12
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Publication No.: US08285418B2Publication Date: 2012-10-09
- Inventor: Aviv Balan
- Applicant: Aviv Balan
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Luedeka Neely Group, P.C.
- Main IPC: G05B19/418
- IPC: G05B19/418
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Abstract:
A profilometer having a guide beam for providing translational movement of substrates in a Y axis relative to a stylus. A first stage receives a first substrate, where the first stage is slidably mounted to the guide beam. The first stage is associated with a first motor for providing independent translational movement for the first stage in an X axis relative to the stylus. A second stage receives a second substrate, where the second stage is slidably mounted to the guide beam. The second stage is associated with a second motor for providing independent translational movement for the second stage in the X axis relative to the stylus, where the first stage and the second stage move together in the Y axis as the guide beam moves in the Y axis, and move independently of one another in the X axis. A robot loads the substrates onto and unloads the substrates off of the first stage and the second stage. A controller directs the robot to load the second substrate onto the second stage, while simultaneously directing the first stage and the guide beam to scan the first substrate on the first stage in the X and Y axes under the stylus, thereby generating profile readings of the first substrate on the first stage.
Public/Granted literature
- US20110022227A1 Dual Scanning Stage Public/Granted day:2011-01-27
Information query
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