发明授权
- 专利标题: MOS device with low injection diode
- 专利标题(中): 具有低注入二极管的MOS器件
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申请号: US12005130申请日: 2007-12-21
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公开(公告)号: US08283723B2公开(公告)日: 2012-10-09
- 发明人: Anup Bhalla , Xiaobin Wang , Ji Pan , Sung-Po Wei
- 申请人: Anup Bhalla , Xiaobin Wang , Ji Pan , Sung-Po Wei
- 申请人地址: BM
- 专利权人: Alpha & Omega Semiconductor Limited
- 当前专利权人: Alpha & Omega Semiconductor Limited
- 当前专利权人地址: BM
- 代理机构: Van Pelt, Yi & James LLP
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
A semiconductor device is formed on a semiconductor substrate. The device includes a drain, an epitaxial layer overlaying the drain, and an active region. The active region includes a body disposed in the epitaxial layer, having a body top surface, a source embedded in the body, extending from the body top surface into the body, a gate trench extending into the epitaxial layer, a gate disposed in the gate trench, an active region contact trench extending through the source and into the body, an active region contact electrode disposed within the active region contact trench, wherein a thin layer of body region separating the active region contact electrode from the drain.
公开/授权文献
- US20090065861A1 MOS device with low injection diode 公开/授权日:2009-03-12
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