Invention Grant
- Patent Title: Spin-on film processing using acoustic radiation pressure
- Patent Title (中): 旋转胶片处理使用声辐射压力
-
Application No.: US12098124Application Date: 2008-04-04
-
Publication No.: US08282999B2Publication Date: 2012-10-09
- Inventor: Nishant Sinha , Gurtej S. Sandhu , John Smythe
- Applicant: Nishant Sinha , Gurtej S. Sandhu , John Smythe
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Schwegman, Lundberg & Woessner, P.A.
- Main IPC: B05D3/06
- IPC: B05D3/06 ; B01J19/10 ; B06B1/00 ; H01L21/31
Abstract:
An apparatus and process operate to impose sonic pressure upon a spin-on film liquid mass that exhibits a liquid topography and in a solvent vapor overpressure to alter the liquid topography. Other apparatus and processes are disclosed.
Public/Granted literature
- US20090253271A1 SPIN-ON FILM PROCESSING USING ACCOUSTIC RADIATION PRESSURE Public/Granted day:2009-10-08
Information query
