发明授权
US08271121B2 Methods and arrangements for in-situ process monitoring and control for plasma processing tools
有权
用于等离子体处理工具的原位过程监控和控制的方法和布置
- 专利标题: Methods and arrangements for in-situ process monitoring and control for plasma processing tools
- 专利标题(中): 用于等离子体处理工具的原位过程监控和控制的方法和布置
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申请号: US12826560申请日: 2010-06-29
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公开(公告)号: US08271121B2公开(公告)日: 2012-09-18
- 发明人: Vijayakumar C. Venugopal , Neil Martin Paul Benjamin
- 申请人: Vijayakumar C. Venugopal , Neil Martin Paul Benjamin
- 申请人地址: US CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: US CA Fremont
- 代理机构: UPSG, P.C., Intellectual Property Law
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
An arrangement for implementing an automatic in-situ process control scheme during execution of a recipe is provided. The arrangement includes control-loop sensors configured at least for collecting a first set of sensor data to facilitate monitoring set points during the recipe execution, wherein the control-loop sensors being part of a process control loop. The arrangement also includes independent sensors configured at least for collecting a second set of sensor data, which is not part of the process control loop. The arrangement yet also includes a hub configured for at least receiving at least one of the first set of sensor data and the second set of sensor data. The arrangement yet further includes an analysis computer communicably coupled with the hub and configured for performing analysis of at least one of the first set of sensor data and the second set of sensor data.
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