发明授权
US08269199B2 Laser heated discharge plasma EUV source 有权
激光加热放电等离子体EUV源

  • 专利标题: Laser heated discharge plasma EUV source
  • 专利标题(中): 激光加热放电等离子体EUV源
  • 申请号: US12277623
    申请日: 2008-11-25
  • 公开(公告)号: US08269199B2
    公开(公告)日: 2012-09-18
  • 发明人: Malcolm W. McGeoch
  • 申请人: Malcolm W. McGeoch
  • 申请人地址: US MA Fall River
  • 专利权人: Plex LLC
  • 当前专利权人: Plex LLC
  • 当前专利权人地址: US MA Fall River
  • 代理机构: Wolf, Greenfield & Sacks, P.C.
  • 主分类号: G21K5/02
  • IPC分类号: G21K5/02
Laser heated discharge plasma EUV source
摘要:
A self-magnetically confined lithium plasma which also may have an applied axial magnetic field is irradiated at sub-critical density by a carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size.
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