发明授权
- 专利标题: Optical device wafer processing method
- 专利标题(中): 光器件晶圆加工方法
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申请号: US12759338申请日: 2010-04-13
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公开(公告)号: US08268656B2公开(公告)日: 2012-09-18
- 发明人: Keiichi Kajiyama
- 申请人: Keiichi Kajiyama
- 申请人地址: JP Tokyo
- 专利权人: Disco Corporation
- 当前专利权人: Disco Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Greer, Burns & Crain, Ltd.
- 优先权: JP2009-102247 20090420
- 主分类号: H01L21/301
- IPC分类号: H01L21/301 ; H01L21/268 ; H01L33/00
摘要:
An optical device wafer processing method including a protective plate attaching step of attaching a transparent protective plate through a double-sided adhesive tape to the front side of a sapphire substrate constituting an optical device wafer, the double-sided adhesive tape being composed of a sheet capable of blocking ultraviolet radiation and adhesive layers formed on both sides of the sheet, wherein the adhesive force of each adhesive layer can be reduced by applying ultraviolet radiation; a sapphire substrate grinding step of grinding the back side of the sapphire substrate; a modified layer forming step of applying a laser beam to the sapphire substrate from the back side thereof to thereby form a modified layer in the sapphire substrate along each street; a protective plate removing step of removing the protective plate in the condition where the double-sided adhesive tape is left on the sapphire substrate; and a wafer dividing step of breaking the sapphire substrate along each street where the modified layer is formed, thus dividing the optical device wafer into individual optical devices in the condition where the double-sided adhesive tape is left on the sapphire substrate.
公开/授权文献
- US20100267219A1 OPTICAL DEVICE WAFER PROCESSING METHOD 公开/授权日:2010-10-21
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