发明授权
- 专利标题： High-strength sputtering target for forming protective film for optical recording medium
- 专利标题（中）： 用于形成光记录介质保护膜的高强度溅射靶
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申请号： US12303590申请日： 2007-06-08
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公开(公告)号： US08268141B2公开(公告)日： 2012-09-18
- 发明人: Shoubin Zhang , Hayato Sasaki , Shozo Komiyama , Akifumi Mishima
- 申请人： Shoubin Zhang , Hayato Sasaki , Shozo Komiyama , Akifumi Mishima
- 申请人地址： JP Tokyo
- 专利权人： Mitsubishi Materials Corporation
- 当前专利权人： Mitsubishi Materials Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Leason Ellis LLP.
- 优先权： JP2006-159303 20060608
- 国际申请： PCT/JP2007/061643 WO 20070608
- 国际公布： WO2007/142333 WO 20071213
- 主分类号： C23C14/34
- IPC分类号： C23C14/34 ; C01B33/20 ; C01B33/46
摘要：
A high-strength sputtering target for forming a protective film for an optical recording medium, obtained by sintering a mixed powder containing, in mol %, 10 to 70% of a zirconium oxide or hafnium oxide and 50% or less (over 0%) of silicon dioxide, and 0.1 to 8.4% of yttrium oxide as necessary, and the remainder containing aluminum oxide, lanthanum oxide, or indium oxide and inevitable impurities, wherein a complex oxide phase of Al6Si2O13, La2SiO5, or In2Si2O7 is formed in a base of the target.
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