Invention Grant
- Patent Title: Method for acquiring overshoot voltage and analyzing degradation of a gate insulation using the same
- Patent Title (中): 用于获取过冲电压并分析其使用栅极绝缘的劣化的方法
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Application No.: US12585948Application Date: 2009-09-29
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Publication No.: US08266572B2Publication Date: 2012-09-11
- Inventor: Sung-Soo Kim , Man-Young Shin , Jang-Hyuk An , Sung-Eun Kim , Nam-Hyung Lee , Yong-Sang Cho
- Applicant: Sung-Soo Kim , Man-Young Shin , Jang-Hyuk An , Sung-Eun Kim , Nam-Hyung Lee , Yong-Sang Cho
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2008-0097096 20081002
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method of acquiring an overshoot voltage applied to a transistor includes determining a first extraction value, the first extraction value including a product of acceleration factors determined in a test of the transistor, determining an applied time, the applied time corresponding to a length of time a voltage deviates from a predetermined level of an input voltage in a circuit employing the transistor, determining a second extraction value by dividing the first extraction value by the applied time, and determining the overshoot voltage by multiplying the second extraction value by the input voltage.
Public/Granted literature
- US20100088660A1 Method for acquiring overshoot voltage and analyzing degradation of a gate insulation using the same Public/Granted day:2010-04-08
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