Invention Grant
- Patent Title: Method for manufacturing a structure provided with DDR zeolite membrane
- Patent Title (中): 制造具有DDR沸石膜的结构的方法
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Application No.: US12846128Application Date: 2010-07-29
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Publication No.: US08263516B2Publication Date: 2012-09-11
- Inventor: Kenji Yajima , Hisayoshi Nonaka , Toshihiro Tomita
- Applicant: Kenji Yajima , Hisayoshi Nonaka , Toshihiro Tomita
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Burr & Brown
- Priority: JP2008-062868 20080312
- Main IPC: B01J29/06
- IPC: B01J29/06 ; B01J39/00

Abstract:
A method for manufacturing a DDR zeolite membrane element including the steps of: immersing a porous substrate in a raw material solution, forming a DDR zeolite membrane containing 1-adamanthanamine on a surface of the porous substrate by subjecting a DDR zeolite to hydrothermal synthesis in the presence of DDR zeolite seed crystals, applying a glass paste onto the surface of the porous substrate so as to contact the membrane, and heating the membrane at 500 to 800° C., thereby burning away the 1-adamanthanamine contained in the membrane and melting the glass paste to form a membrane-like glass seal contacting the membrane on the surface of the porous substrate. The method for manufacturing a DDR zeolite membrane element can inhibit the permeation of the DDR zeolite membrane from being hindered in a contact portion between the membrane and the glass seal and inhibit poor seal of the glass seal.
Public/Granted literature
- US20100298115A1 METHOD FOR MANUFACTURING A STRUCTURE PROVIDED WITH DDR ZEOLITE MEMBRANE Public/Granted day:2010-11-25
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