Invention Grant
US08262824B2 Method for manufacturing electret diaphragm 有权
驻极体膜片制造方法

  • Patent Title: Method for manufacturing electret diaphragm
  • Patent Title (中): 驻极体膜片制造方法
  • Application No.: US12605142
    Application Date: 2009-10-23
  • Publication No.: US08262824B2
    Publication Date: 2012-09-11
  • Inventor: Fang Ching Lee
  • Applicant: Fang Ching Lee
  • Applicant Address: TW Taoyuan County
  • Assignee: HTC Corporation
  • Current Assignee: HTC Corporation
  • Current Assignee Address: TW Taoyuan County
  • Priority: TW97141128A 20081027
  • Main IPC: H04R7/22
  • IPC: H04R7/22
Method for manufacturing electret diaphragm
Abstract:
A method for manufacturing electret diaphragms is provided. First, a dielectric film is attached to a frame by an adhesive material and a fastening element grips the peripheral area of the dielectric film on the frame. Afterward, the dielectric film is subjected to a metal sputtering process to form a conductive material layer thereon. Finally, the dielectric film is subjected to a polarizing process thereby forming an electret diaphragm.
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