Invention Grant
US08252190B2 Method for manufacturing a magnetic write head having a hard mask defined write pole trailing edge step
有权
一种用于制造具有硬掩模定义的写磁极后缘步进的磁写头的方法
- Patent Title: Method for manufacturing a magnetic write head having a hard mask defined write pole trailing edge step
- Patent Title (中): 一种用于制造具有硬掩模定义的写磁极后缘步进的磁写头的方法
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Application No.: US12343720Application Date: 2008-12-24
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Publication No.: US08252190B2Publication Date: 2012-08-28
- Inventor: Aron Pentek , Sue Siyang Zhang , Yi Zheng
- Applicant: Aron Pentek , Sue Siyang Zhang , Yi Zheng
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Main IPC: B44C1/22
- IPC: B44C1/22 ; G11B5/127 ; H04R31/00

Abstract:
A method for manufacturing a magnetic write head having a write pole with a tapered trailing edge step. The resulting tapered trailing edge step maximizes write field at very small bit sizes by preventing the magnetic saturation of the write pole at the pole tip. The method includes depositing a magnetic write pole material and then depositing a magnetic material over the magnetic write pole material. A RIE mask and hard mask are deposited over the magnetic bump material. A resist mask is formed over the RIE mask and hard mask, and a reactive ion etching is performed to transfer the pattern of the resist mask onto the underlying hard mask. Then an ion milling is performed to form a the magnetic step layer with a tapered edge that defines a tapered trailing edge step structure of the write pole.
Public/Granted literature
- US20100155367A1 METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A HARD MASK DEFINED WRITE POLE TRAILING EDGE STEP Public/Granted day:2010-06-24
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