发明授权
- 专利标题: Plasma system and measurement method
- 专利标题(中): 等离子体系统和测量方法
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申请号: US12312790申请日: 2007-11-26
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公开(公告)号: US08242789B2公开(公告)日: 2012-08-14
- 发明人: Stephen Daniels , Justin Lawler , Victor John Law
- 申请人: Stephen Daniels , Justin Lawler , Victor John Law
- 申请人地址: IE Dublin
- 专利权人: Dublin City University
- 当前专利权人: Dublin City University
- 当前专利权人地址: IE Dublin
- 代理机构: Jacobson Holman PLLC
- 优先权: IE2006/0855 20061127
- 国际申请: PCT/IE2007/000116 WO 20071126
- 国际公布: WO2008/065635 WO 20080605
- 主分类号: G01R27/04
- IPC分类号: G01R27/04
摘要:
A plasma system (1) has a circuit including a DC source (6), a power supply line (9), an electrodes (2, 3), and a return line (18). A perturbation signal source (8) delivers a perturbation signal into the circuit in addition to DC voltage from the DC source (6). Acquisition (10) and analysis (11) systems measure response to the perturbation. The analysis system (11) measures variation in impedance of the circuit and phase between voltage and current in the circuit. It also uses a frequency domain reflectrometry technique to measure signal reflection modulus of a supply line of the circuit over a defined frequency range.
公开/授权文献
- US20100033194A1 PLASMA SYSTEM AND MEASUREMENT METHOD 公开/授权日:2010-02-11
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