发明授权
- 专利标题: Extreme ultraviolet light source device and control method for extreme ultraviolet light source device
- 专利标题(中): 极紫外光源装置及极紫外光源装置的控制方法
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申请号: US12612861申请日: 2009-11-05
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公开(公告)号: US08242472B2公开(公告)日: 2012-08-14
- 发明人: Masato Moriya , Osamu Wakabayashi
- 申请人: Masato Moriya , Osamu Wakabayashi
- 申请人地址: JP Tokyo
- 专利权人: Gigaphoton Inc.
- 当前专利权人: Gigaphoton Inc.
- 当前专利权人地址: JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2008-285911 20081106; JP2009-251632 20091102
- 主分类号: G02B5/00
- IPC分类号: G02B5/00
摘要:
[Problem]An extreme ultraviolet light source device in accordance with the present invention corrects an optical performance of a laser beam in an appropriate manner.[Means for Resolution]A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system 30 that amplifies a laser beam that is output from a driver laser oscillator 20. The guide laser beam is output from a laser device 50 as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror 52. A sensor 44 detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller 60 outputs a signal to a wave front correction part 34 based on a measured result of a sensor 36. The wave front correction part 34 corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller 60.
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