Invention Grant
- Patent Title: Methods of forming structures having nanotubes extending between opposing electrodes and structures including same
- Patent Title (中): 形成具有在相对电极之间延伸的纳米管和包括其的结构的方法
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Application No.: US12176013Application Date: 2008-07-18
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Publication No.: US08222127B2Publication Date: 2012-07-17
- Inventor: Eugene P. Marsh , Gurtej S. Sandhu
- Applicant: Eugene P. Marsh , Gurtej S. Sandhu
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L29/66

Abstract:
A semiconductor structure including nanotubes forming an electrical connection between electrodes is disclosed. The semiconductor structure may include an open volume defined by a lower surface of an electrically insulative material and sidewalls of at least a portion of each of a dielectric material and opposing electrodes. The nanotubes may extend between the opposing electrodes, forming a physical and electrical connection therebetween. The nanotubes may be encapsulated within the open volume in the semiconductor structure. A semiconductor structure including nanotubes forming an electrical connection between source and drain regions is also disclosed. The semiconductor structure may include at least one semiconducting carbon nanotube electrically connected to a source and a drain, a dielectric material disposed over the at least one semiconducting carbon nanotube and a gate dielectric overlying a portion of the dielectric material. Methods of forming the semiconductor structures are also disclosed.
Public/Granted literature
- US20100012922A1 METHODS OF FORMING STRUCTURES INCLUDING NANOTUBES AND STRUCTURES INCLUDING SAME Public/Granted day:2010-01-21
Information query
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