发明授权
- 专利标题: Coating composition for antireflection with resistance and antireflection characteristic and antireflection film prepared by using the same
- 专利标题(中): 用于具有电阻和抗反射特性的抗反射涂料组合物和使用其制备的抗反射膜
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申请号: US12448589申请日: 2007-12-28
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公开(公告)号: US08213086B2公开(公告)日: 2012-07-03
- 发明人: Yeong-Rae Chang , Young-Jun Hong , Young-Eun Lee , Tae-Su Kim , Hyun-Woo Shin , Bu-Gon Shin
- 申请人: Yeong-Rae Chang , Young-Jun Hong , Young-Eun Lee , Tae-Su Kim , Hyun-Woo Shin , Bu-Gon Shin
- 申请人地址: KR Seoul
- 专利权人: LG Chem, Ltd.
- 当前专利权人: LG Chem, Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: McKenna Long & Aldridge LLP
- 优先权: KR10-2006-0137601 20061229
- 国际申请: PCT/KR2007/006917 WO 20071228
- 国际公布: WO2008/082168 WO 20080710
- 主分类号: G02B1/10
- IPC分类号: G02B1/10
摘要:
A coating composition for antireflection that includes a low refraction-thermosetting resin having a refractive index of 1.2 to 1.45, a high refraction-ultraviolet curable resin having a refractive index of 1.46 to 2, and an ultraviolet absorber; an antireflection film manufactured using the coating composition; and a method of manufacturing the antireflection film. The antireflection film has excellent abrasion resistance and antireflection characteristic. Further, since the antireflection film can be manufactured in one coating process, it is possible to reduce manufacturing cost.
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