Invention Grant
US08212988B2 Projection objective for microlithography 有权
微光刻的投影目标

  • Patent Title: Projection objective for microlithography
  • Patent Title (中): 微光刻的投影目标
  • Application No.: US11658574
    Application Date: 2005-08-03
  • Publication No.: US08212988B2
    Publication Date: 2012-07-03
  • Inventor: Bernd Geh
  • Applicant: Bernd Geh
  • Applicant Address: DE Oberkochen
  • Assignee: Carl Zeiss GmbH
  • Current Assignee: Carl Zeiss GmbH
  • Current Assignee Address: DE Oberkochen
  • Agency: Sughrue Mion, PLLC
  • International Application: PCT/EP2005/008392 WO 20050803
  • International Announcement: WO2006/013100 WO 20060209
  • Main IPC: G03B27/42
  • IPC: G03B27/42
Projection objective for microlithography
Abstract:
A projection objective for imaging a pattern arranged in an object surface of the projection objective into an image surface of the projection objective with a demagnified imaging scale has a plurality of optical elements which are arranged along an optical axis of the projection objective and are configured in such a way that a defined image field curvature of the projection objective is set in such a way that an object surface that is curved convexly with respect to the projection objective can be imaged into a planar image surface. What can be achieved given a suitable setting of the object surface curvature is that a gravitation-dictated bending of a mask does not have a disturbing effect on the imaging quality.
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