Invention Grant
- Patent Title: Method of forming magnetic layer pattern, and method of manufacturing perpendicular magnetic recording head
- Patent Title (中): 形成磁性层图案的方法以及制造垂直磁记录头的方法
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Application No.: US12926817Application Date: 2010-12-10
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Publication No.: US08201321B2Publication Date: 2012-06-19
- Inventor: Naoto Matono , Tatsuya Harada
- Applicant: Naoto Matono , Tatsuya Harada
- Applicant Address: JP Tokyo CN Hong Kong
- Assignee: TDK Corporation,SAE Magnetics (H.K.) Ltd.
- Current Assignee: TDK Corporation,SAE Magnetics (H.K.) Ltd.
- Current Assignee Address: JP Tokyo CN Hong Kong
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-45679 20060222; JP2006-316149 20061122
- Main IPC: G11B5/17
- IPC: G11B5/17 ; H04R31/00

Abstract:
Provided is a method of manufacturing a perpendicular magnetic recording head which can enhance accuracy and simplify the manufacturing process. The method includes: forming a photoresist pattern having an opening part; forming a non-magnetic layer so as to narrow the opening part by a dry film forming method such as ALD method; stacking a seed layer and a plating layer so as to bury the opening part provided with the non-magnetic layer; and forming a main magnetic pole layer by polishing the non-magnetic layer, the seed layer, and the plating layer by CMP method until the photoresist pattern is exposed. The final opening width is unsusceptible to variations, thus reducing the number of the steps of forming the main magnetic layer.
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