Invention Grant
- Patent Title: Method of measuring in situ differential emissivity and temperature
- Patent Title (中): 测量原位差分发射率和温度的方法
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Application No.: US12574096Application Date: 2009-10-06
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Publication No.: US08192077B2Publication Date: 2012-06-05
- Inventor: Michael Twerdochlib
- Applicant: Michael Twerdochlib
- Applicant Address: US FL Orlando
- Assignee: Siemens Energy, Inc.
- Current Assignee: Siemens Energy, Inc.
- Current Assignee Address: US FL Orlando
- Main IPC: G01J5/02
- IPC: G01J5/02
Abstract:
A method for measuring the differential emissivity between two sites on the surface of a body and the temperature of the two sites. The method includes a plurality of measurements of the infrared radiation arising from each of the two sites under a number of different conditions. Some of the measurements include irradiation by external infrared radiation at a known wavelength and intensity. The infrared radiation arising from each of the sites may include emitted radiation, reflected ambient radiation, and reflected external radiation. Additionally, the temperature determined using the method described can be used to calibrate infrared imaging devices used to inspect the entire body.
Public/Granted literature
- US20100014555A1 METHOD OF MEASURING IN SITU DIFFERENTIAL EMISSIVITY AND TEMPERATURE Public/Granted day:2010-01-21
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