Invention Grant
- Patent Title: Multi-beam source
- Patent Title (中): 多光束源
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Application No.: US12178153Application Date: 2008-07-23
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Publication No.: US08183543B2Publication Date: 2012-05-22
- Inventor: Elmar Platzgummer
- Applicant: Elmar Platzgummer
- Applicant Address: AT Vienna
- Assignee: IMS Nanofabrication AG
- Current Assignee: IMS Nanofabrication AG
- Current Assignee Address: AT Vienna
- Agency: RatnerPrestia
- Priority: ATA1174/2007 20070724
- Main IPC: A61N5/00
- IPC: A61N5/00 ; G21G5/00

Abstract:
A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.
Public/Granted literature
- US20090026389A1 MULTI-BEAM SOURCE Public/Granted day:2009-01-29
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