发明授权
US08179523B2 Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same
有权
光掩模安装/壳体装置和抗蚀剂检查方法和使用其的抗蚀剂检查装置
- 专利标题: Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same
- 专利标题(中): 光掩模安装/壳体装置和抗蚀剂检查方法和使用其的抗蚀剂检查装置
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申请号: US13195593申请日: 2011-08-01
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公开(公告)号: US08179523B2公开(公告)日: 2012-05-15
- 发明人: Yoshikazu Katou , Takahiro Igeta , Hideyuki Moribe , Ryuji Hasegawa
- 申请人: Yoshikazu Katou , Takahiro Igeta , Hideyuki Moribe , Ryuji Hasegawa
- 申请人地址: JP Tokyo
- 专利权人: NEC Corporation
- 当前专利权人: NEC Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2007-330488 20071221
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
A resist inspection apparatus is provided which has a configuration in which a reticle is separated from a pellicle. A reticle cassette is made up of two pieces of plate members. A hollowed portion with a shape allowing the reticle to be inserted into the plate member. Another hollowed portion having a shape being slightly larger than that of the resist of the reticle is formed on the plate member. In the circumference of the hollowed portion is placed a pellicle frame on which a protective film is formed in a stretched manner. In the concave portion is housed in the reticle with a resist on the reticle directed toward the hollowed portion. The reticle is put in sealed space.
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