Invention Grant
- Patent Title: Magnetoresistive element, method of manufacturing the same, and magnetic multilayered film manufacturing apparatus
- Patent Title (中): 磁阻元件及其制造方法以及磁性多层膜制造装置
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Application No.: US12114468Application Date: 2008-05-02
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Publication No.: US08174800B2Publication Date: 2012-05-08
- Inventor: Koji Tsunekawa , David Djayaprawira
- Applicant: Koji Tsunekawa , David Djayaprawira
- Applicant Address: JP Kawasaki-shi
- Assignee: Canon Anelva Corporation
- Current Assignee: Canon Anelva Corporation
- Current Assignee Address: JP Kawasaki-shi
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2007-122367 20070507; JP2008-110434 20080421
- Main IPC: G11B5/39
- IPC: G11B5/39
Abstract:
A magnetoresistive element includes an antiferromagnetic layer formed from a layer containing manganese, a layered magnetization fixed layer which includes a first magnetization fixed layer located over a side of the antiferromagnetic layer and formed from a layer containing a ferromagnetic material and a platinum group metal, a second magnetization fixed layer formed from a layer containing a ferromagnetic material, and a first nonmagnetic intermediate layer located between the first magnetization fixed layer and the second magnetization fixed layer, a magnetic free layer formed from a layer containing a ferromagnetic material, and a second nonmagnetic intermediate layer located between the layered magnetization fixed layer and the magnetic free layer.
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