发明授权
US08174679B2 Illumination optical system, exposure apparatus, and device fabrication method 有权
照明光学系统,曝光装置和装置制造方法

  • 专利标题: Illumination optical system, exposure apparatus, and device fabrication method
  • 专利标题(中): 照明光学系统,曝光装置和装置制造方法
  • 申请号: US12390351
    申请日: 2009-02-20
  • 公开(公告)号: US08174679B2
    公开(公告)日: 2012-05-08
  • 发明人: Michio Kono
  • 申请人: Michio Kono
  • 申请人地址: JP Tokyo
  • 专利权人: Canon Kabushiki Kaisha
  • 当前专利权人: Canon Kabushiki Kaisha
  • 当前专利权人地址: JP Tokyo
  • 代理机构: Canon USA Inc IP Division
  • 优先权: JP2008-048825 20080228
  • 主分类号: G03B27/52
  • IPC分类号: G03B27/52
Illumination optical system, exposure apparatus, and device fabrication method
摘要:
The present invention provides an illumination optical system which illuminates a surface to be illuminated with light from a light source, the illumination optical system including a plurality of illumination systems configured to form predetermined illumination regions with the light from the light source, an optical system having reflecting surfaces, which are configured to reflect the light beams from the illumination systems, respectively for the plurality of illumination systems, and a light-shielding unit configured to shield a certain light component in a composite illumination region formed by the light from the optical system to shape a shape of the composite illumination region, wherein one continuous composite illumination region is formed on the surface to be illuminated by connecting the respective illumination regions by reflecting the light beams from the plurality of illumination systems by the reflecting surfaces.
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