Invention Grant
- Patent Title: Specimen observation method
- Patent Title (中): 标本观察法
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Application No.: US12501822Application Date: 2009-07-13
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Publication No.: US08164058B2Publication Date: 2012-04-24
- Inventor: Eiko Nakazawa , Masahiro Tomita , Hiroyuki Kobayashi
- Applicant: Eiko Nakazawa , Masahiro Tomita , Hiroyuki Kobayashi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-068472 20060314
- Main IPC: G21K7/00
- IPC: G21K7/00

Abstract:
It is an object of the present invention to provide a specimen observation method, an image processing device, and a charged-particle beam device which are preferable for selecting, based on an image acquired by an optical microscope, an image area that should be acquired in a charged-particle beam device the representative of which is an electron microscope. In the present invention, in order to accomplish the above-described object, there are provided a method and a device for determining the position for detection of charged particles by making the comparison between a stained optical microscope image and an elemental mapping image formed based on X-rays detected by irradiation with the charged-particle beam.
Public/Granted literature
- US20090274359A1 SPECIMEN OBSERVATION METHOD Public/Granted day:2009-11-05
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